PVD Process
Process Description
PVD is short for Physical Vapor Deposition, indicating under conditions of a vacuum, low-voltage, and high-current arc discharge technique, then conduct target evaporation on the material and gas to cause electrical discharges, and using the acceleration of the electric field, the evaporated substance will react with the product by depositing itself onto the workpiece. After PVD treatment, the film has higher levels of hardness, low coefficient of friction, good abrasion resistance, and chemical stability advantages, and etc. Our company is experienced with the PVD process technology and has two PVD lines, and has experience working with aluminum, nickel, chromium, tin, and a dozen other materials.
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Last updated:2019-02-14 11:00:00

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